Ultrasonic Coating System for Photoresist Deposition
Ultrasonic Coating System for Photoresist Deposition Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Cheersonic ultrasonic atomization equipment has been used to apply photoresist film coatings on semiconductor wafers. As high-aspect-ratio MEMS and sensor manufacturing continues to expand, Cheersonic has developed a suite of photoresist thin film coatings that overcome the challenges of uniformly covering photoresist onto wafers with deep trenches or difficult topography. The UAM6000 was designed based [...]
