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So far cheersonic has created 500 blog entries.

Ultrasonic Coating System for Photoresist Deposition

Ultrasonic Coating System for Photoresist Deposition Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Cheersonic ultrasonic atomization equipment has been used to apply photoresist film coatings on semiconductor wafers. As high-aspect-ratio MEMS and sensor manufacturing continues to expand, Cheersonic has developed a suite of photoresist thin film coatings that overcome the challenges of uniformly covering photoresist onto wafers with deep trenches or difficult topography. The UAM6000 was designed based [...]

2022-11-08T08:18:55+00:00

Development of Mask

Development of Mask Development of Mask - Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Photolithography technology is a core step in semiconductor device manufacturing process, and lithography machine is also known as mask alignment exposure machine. This is because the commonly used lithography machine is mask alignment lithography. The optical lithography technology has roughly gone through three stages so far, and the mask plays an important role in [...]

2022-11-08T08:17:20+00:00

Fully Automate Reciprocating Ultrasonic Spray Fluxing System

Fully Automate Reciprocating Ultrasonic Spray Fluxing System UAM8000 is a fully automate reciprocating ultrasonic spray fluxing system that is designed for spraying water soluble/organic acid fluxes. All of the materials are constructed with materials that are proven compatible with these very corrosive fluxes. This versatile system is easily integrated with all major wave solder machines. The flexibility of selective area fluxing or full board width coverage combined with the ability [...]

2022-11-08T08:15:49+00:00

Spray Coating Photoresist On Silicon Wafers

Spray Coating Photoresist On Silicon Wafers Spray Coating Photoresist On Silicon Wafers - Ultrasonic Photoresist Coater - Cheersonic Spin coating of photoresist, although an established technique for resist depositionis often not suitable for applications with high topography on the silicon or glasssurface. Since 3D structures such as trenches, V-grooves and holes are basic elementsin building the required functionality of MEMS devices, spin coating usually causesdefects on the resist layer. Especially [...]

2022-11-08T08:12:14+00:00

Spray Anti-reflective Coating

Spray Anti-reflective Coating Spray Anti-reflective Coating Using Cheersonic Ultrasonic Spray Systems For future curved display glasses for automotive interior applications, in addition to an anti-glare surface and a hydrophobic coating, a high-quality anti-reflective coating is increasingly required. The three-dimensional surface of the display glasses places very high demands on the coating technology. Antireflective coatings applied by ultrasonic spray technology could be an interesting alternative for us to the classic high-vaccum [...]

2022-11-08T08:13:53+00:00

Photoresist Coating Process

Photoresist Coating Process Photoresist Coating Process - Photoresist Deposition - Cheersonic The photoresist needs to form a uniform film on the surface of the wafer, and the photoresist is coated on the wafer by the coating equipment under high-speed rotation. The thickness of the photoresist can be adjusted according to the rotational speed and the viscosity of the photoresist. The higher the rotational speed, the thinner the film, and the [...]

2022-11-02T02:13:54+00:00

Megasonic Cleaning Applications

Megasonic Cleaning Applications Megasonic Cleaning Applications - Semiconductor Cleaning - Cheersonic Megasonic cleaning technology, as a nano-scale cleaning technology represented by ultra-precision cleaning, plays a pivotal role in the field of semiconductor cleaning, and has become a promising dark horse in the field of cutting-edge precision cleaning: it can not only complete Si wafers, GaAs, liquid crystal glass and other The cleaning of the glass mask can also complete the [...]

2022-11-02T02:12:04+00:00

The Importance Of Masks

The Importance Of Masks The Importance Of Masks - Semiconductor Coatings - Cheersonic The mask is a graphic transfer tool or master in the microelectronics manufacturing process, and it is the carrier of intellectual property information such as graphic design and process technology. The function of the mask is similar to the "negative film" of a traditional camera. The production process is: 1. Using quartz glass as the substrate (there [...]

2022-10-26T02:25:35+00:00

R&D Ultrasonic Coater

R&D Ultrasonic Coater R&D Ultrasonic Coater - Ultrasonic Coating Systems - Cheersonic For the benchtop ultrasonic coater UAM4000L, it is popular in laboratory R&D and low-volume production. It is installed with exercise system, Control System, Cargo system, Ultrasonic system, Liquid supply system, Exhaust system and Lighting system etc. Cheersonic focused on the ultrasonic coating technology more than 20 years. We supply a series of ultrasonic coaters for advanced energy, electronic, [...]

2022-10-26T02:27:07+00:00

Photoresist Coating Deposition

Photoresist Coating Deposition Photoresist Coating Deposition - Polyimide Coating Process - Cheersonic Photoresist is mainly coated by spin coating (also known as "spin coating"). For thin resists, the best spin coating speed is 2000~4000rpm. For relatively thick resists, the best spin coating speed For 250~2000rpm, the speed of the glue machine can usually reach 9000rpm, and in some cases, a slower speed of 1000~200rpm can be used to obtain specific [...]

2022-10-26T02:28:33+00:00
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