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So far cheersonic has created 295 blog entries.

Photoresist Coating Process

Photoresist Coating Process Photoresist Coating Process - Photoresist Deposition - Cheersonic The photoresist needs to form a uniform film on the surface of the wafer, and the photoresist is coated on the wafer by the coating equipment under high-speed rotation. The thickness of the photoresist can be adjusted according to the rotational speed and the viscosity of the photoresist. The higher the rotational speed, the thinner the film, and the [...]

2022-11-02T02:13:54+00:00

Megasonic Cleaning Applications

Megasonic Cleaning Applications Megasonic Cleaning Applications - Semiconductor Cleaning - Cheersonic Megasonic cleaning technology, as a nano-scale cleaning technology represented by ultra-precision cleaning, plays a pivotal role in the field of semiconductor cleaning, and has become a promising dark horse in the field of cutting-edge precision cleaning: it can not only complete Si wafers, GaAs, liquid crystal glass and other The cleaning of the glass mask can also complete the [...]

2022-11-02T02:12:04+00:00

The Importance Of Masks

The Importance Of Masks The Importance Of Masks - Semiconductor Coatings - Cheersonic The mask is a graphic transfer tool or master in the microelectronics manufacturing process, and it is the carrier of intellectual property information such as graphic design and process technology. The function of the mask is similar to the "negative film" of a traditional camera. The production process is: 1. Using quartz glass as the substrate (there [...]

2022-10-26T02:25:35+00:00

R&D Ultrasonic Coater

R&D Ultrasonic Coater R&D Ultrasonic Coater - Ultrasonic Coating Systems - Cheersonic For the benchtop ultrasonic coater UAM4000L, it is popular in laboratory R&D and low-volume production. It is installed with exercise system, Control System, Cargo system, Ultrasonic system, Liquid supply system, Exhaust system and Lighting system etc. Cheersonic focused on the ultrasonic coating technology more than 20 years. We supply a series of ultrasonic coaters for advanced energy, electronic, [...]

2022-10-26T02:27:07+00:00

Photoresist Coating Deposition

Photoresist Coating Deposition Photoresist Coating Deposition - Polyimide Coating Process - Cheersonic Photoresist is mainly coated by spin coating (also known as "spin coating"). For thin resists, the best spin coating speed is 2000~4000rpm. For relatively thick resists, the best spin coating speed For 250~2000rpm, the speed of the glue machine can usually reach 9000rpm, and in some cases, a slower speed of 1000~200rpm can be used to obtain specific [...]

2022-10-26T02:28:33+00:00

Hydrophilic Coating on Microfluidic Chips

Hydrophilic Coating on Microfluidic Chips Hydrophilic Coating on Microfluidic Chips - Ultrasonic Spray System - Cheersonic Application: IVD Substrate: microfluidic chips, size: from a few millimeters to 15x15cm or 20x20cm max. Thickness of the film: cover surface with a thin layer of fluid/chemical/reagent Usage: R&D stage and early prototyping stages Cover with some chemicals the surface of chip excluding the channel and the chamber The ultrasonic spray coating machine from [...]

2022-10-17T06:00:10+00:00

Wafer Cleaning Process

Wafer Cleaning Process Wafer Cleaning Process - Megasonic Cleaning Systems - Cheersonic In the chip manufacturing industry, semiconductor cleaning runs through the industry, and the steps account for more than 30% of the total production process. It is a key process that affects the quality of wafers and chip performance, with a market space of more than 40 billion. Although it is inferior to core equipment such as lithography machines [...]

2022-10-17T06:01:47+00:00

Ultrasonic Spray Coating System For Photoresists

Ultrasonic Spray Coating System For Photoresists Ultrasonic Spray Coating System For Photoresists - Cheersonic The ultrasonic spray coating systems are proven for various applications in which uniform, repeatable coatings of photoresist or polyimide films are required. Based on below application, a. Substrate: flat, square or rectangular; thickness: 1/4’’, b. Size of substrate: width/length: typically 24’’, 30-32"; c. Liquid: photoresists d. Work requirement: 5-10 coatings in a day type of thing [...]

2022-10-17T06:03:22+00:00

Photoresist Composition

Photoresist Composition Photoresist Composition - Deposition of Thin Photoresist Films - Cheersonic Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. Photoinitiators (including photosensitizers, photoacid generators): Photoinitiators, also known as photosensitizers or photocuring agents, are a type of energy that can absorb a certain wavelength from light (usually ultraviolet light). Photochemical reactions produce molecules [...]

2022-10-08T05:27:18+00:00

Introduction of Photoresist Classification

Introduction of Photoresist Classification Introduction of Photoresist Classification - Deposit Photoresist - Cheersonic 1. Classification by application field Photoresists are classified by application fields and can be divided into PCB photoresists, display panel photoresists, semiconductor photoresists and other photoresists. In the PCB industry: the main photoresists used are dry film photoresist, wet film photoresist, photosensitive solder resist ink, etc. The dry film is pasted on the treated copper-clad plate with [...]

2022-10-08T05:28:50+00:00
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