Wafer Etching
Wafer Etching Wafer Etching - Polyimide Coatings - Photoresist Coating - Cheersonic After the photolithography of the circuit pattern on the wafer is completed, an etching process is used to remove any excess oxide film and leave only the semiconductor circuit pattern. To do this requires the use of liquid, gas or plasma to remove selected excess. There are two main methods of etching, depending on the substance used: wet [...]
